Technology Laboratories of DCMP

 

Apparatus for deposition of thin films by sputtering, suitable for materials highly susceptible to oxidation, such as lanthanides or actinides. The system works with
micro dots (to 3), plants may be less than 100 mg. In addition to heating substrate temperature of 850 ° C with a cooling to 100 K. Chance reactive sputtering in an Ar containing N or H.

 

Naprašovačka Sputter Sputter

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